Системы управления электронной оптикой
DESCRIPTION
The electron optics control system is designed to power and control the electromagnetic elements of scanning electron microscopes and electron beam columns. It is a multichannel set of precision current sources for the condenser and objective lenses, stigmators, alignment coils and the electron beam deflection system.
High output current stability and low ripple ensure stable electron optics parameters, reproducible focusing and minimal beam position drift. The number of channels, output current and voltage ranges, response speed and system composition can be adapted to a specific column. The system can be used together with high-voltage electron gun power supplies with thermionic, LaB6 or field emitters.
FEATURES
- Precision current control of electromagnetic lenses
- Separate channels for the objective and condenser lenses
- Bipolar control channels for stigmators and alignment coils
- Fast bipolar line and frame scan channels
- Low output current ripple and noise
- High long-term and temperature stability
- Software limit of the maximum current for each channel
- Adjustable current ramp rate
- Output current and voltage monitoring for each channel
- Short-circuit, overload and overheating protection
- Digital control and remote monitoring
- Configurations built to the parameters of a specific electron column
APPLICATION
- Scanning electron microscopy
- Electron beam columns
| Channel | Output current | Compliance voltage | Type |
|---|---|---|---|
| Objective lens | 0…2 A | up to 30 V | unipolar CC |
| Condenser lens 1 | 0…1 A | up to 24 V | unipolar CC |
| Condenser lens 2 | 0…1 A | up to 24 V | unipolar CC |
| Stigmator X | ±150 mA | ±12 V | bipolar CC |
| Stigmator Y | ±150 mA | ±12 V | bipolar CC |
| Alignment X | ±300 mA | ±15 V | bipolar CC |
| Alignment Y | ±300 mA | ±15 V | bipolar CC |
| Scan X | ±500 mA | ±24 V | bipolar CC |
| Scan Y | ±500 mA | ±24 V | bipolar CC |
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